Implant-concept –implant functionalization with CeraPlas technology The compact chamber requires no external gas input, operates under atmospheric conditions and uses an innovative, compact form of plasma generation for non-thermal or “cold” plasma |
Implant Plasma Generator
Implant plasma-concept –
implant functionalization with CeraPlas technology
Medical engineering materials such as zirconia ceramics or titanium and stainless steel, but also PEEK, Teflon, silicone and highly filled polymers can be effectively optimized in their wetting behavior. This property is the basis for a good adhesive bond or biocompatibility and acceptance by the surrounding living tissue. This technology has already been used for many years in order to functionalize implants in dentistry. By functionalizing the surfaces with atmospheric pressure plasma, the surface is cleaned, the implant sterilized and the risk of infection reduced. At the same time, the surface energy of the implant is increased. The improved wettability improves cell deposition on the surface of the implant and accelerates the healing process.
Both medical and dental implants are required to be sterile and to display excellent wettability to reduce the risk of infection, inflammation or being rejected by the surrounding tissue. The new implant plasma concept offers a quick and easy treatment of the implant that reduces germs on the surface while at the same time increasing its wettability by using atmospheric pressure plasma.
The compact chamber requires no external gas input, operates under atmospheric conditions and uses an innovative, compact form of plasma generation for non-thermal or “cold” plasma. Based on one of the world’s smallest plasma generators, the highly efficient PDD (Piezo Dielectric Discharge) Technology® can be used in a wide variety of applications requiring little space and power.
Application implant plasma
The implant plasma is the new device for functionalizing implants to optimize their surface properties. This device enables automated plasma treatment immediately prior to implantation. The implant is placed in a small chamber in which a 30-second plasma treatment is started at the push of a button. To ensure that the implant is treated evenly, it rotates in front of the plasma discharge. After treatment, the ozone produced is automatically neutralized by an activated carbon filter in a 10-second process. All treatment steps are indicated by a display and LED signals. By functionalizing the surfaces with atmospheric pressure plasma, the surface is cleaned, the implant sterilized and the risk of infection reduced. The improved wettability promotes cell formation on the surface of the implant and the healing process is accelerated.
Technology
RP Plasma has developed the PDD technology (Piezoelectric Direct Discharge) for particularly compact plasma generation. The PDD Technology is based on the direct electrical discharge at an open piezoelectric transformer (PT). The PDD technology transforms a low input voltage. This results in a high electric field strength. This dissociates and ionizes the surrounding process gas – typically air. Disinfection is mainly carried out by oxidizing odour-producing molecules and microorganisms with ozone.
Advantages
The advantages of the RP plasma implant plasma are obvious:
- Small and compact
- Proven and safe application
- Extremely easy handling for the end user
- Very energy-efficient due to low heat losses
- Very environmentally friendly – no auxiliary materials such as chemicals or additives necessary
- Easy to use
- Only 24 V required for operation (power supply for standard socket)
- Highly efficient and safe excitation of gas molecules
- Extremely high power density of the compact device